Wafer Cleaning (Simple Cleanroom Method)

Wafer Cleaning (Simple Cleanroom Method ā€“ Oil Removal)

  1. Rinse or immerse the wafer in acetone for 30ā€“60 seconds to remove oil and organic contaminants.

  2. Immediately rinse the wafer with isopropyl alcohol (IPA). Do not allow the wafer to dry between steps.

  3. Rinse thoroughly with deionized (DI) water.

  4. Dry the wafer using a nitrogen (Nā‚‚) gun or a spin rinse dryer (SRD).

Notes:

  • Always use fresh solvents.

  • Handle the wafer only at the edges using clean tweezers.

  • Do not allow acetone to dry on the wafer surface.

  • Avoid touching or wiping the wafer surface.