Model: Savannah - Thermal ALD for R&D
Location: SE1 154 (cleanroom Class 1000)
Atomic Layer Deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas-phase chemical process.
Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.
